VHDL高級綜合中的多目標工藝映射方法
A METHODOLOGY OF TECHNOLOGY MAPPING FOR MULTI-TARGET IN VHDL HIGH LEVEL SYNTHESIS SYSTEM
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摘要: 從國內(nèi)情況看,高級綜合系統(tǒng)的目標,即后端CAD版圖工具可分為兩大類。一類只能接收門級網(wǎng)表;而另一類其單元庫較為完備,往往能接收較大顆粒度的宏單元。針對這種情況,本文研究高級綜合結果與后端工藝的銜接問題。提出多目標多層次工藝映射(MLTMMT)策略,旨在與多種工藝銜接。解決實現(xiàn)該策略的有關問題:(1)給出多目標工藝映射方法的形式化描述;(2)給出在多個層次上的多目標工藝映射方法;(3)分析研究多種工藝庫,提出一種面積和延時的線性模型;(4)給出RTL通用元件集;(5)建立多種工藝VHDL模擬模型。所實現(xiàn)的系統(tǒng)已完成與三種工藝銜接,驗證了本文工作。Abstract: This paper is focused on the research of connecting the HLS(High Level Synthesis) result to the technology of IC,To connect to deferent technology, a tactics of MLTMMT(Multi Level Technology Mapping for Multi-Target)is proposed, All key points are researched which include: (1)giying the formal descirption of the technology mapping for multi-target; (2)giving the method of MLTMMT; (3)analyzing and researching many technology libraries,presenting a lineal model of area and delay of the technology cells: (4)giving the set of the general RTL components; (5)building the VHDL simulation model in different technologies.The system has been connected To 3 kinds of IC prodaction line: and this verifies the theory and method.
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