GaAs,GaP,InP,GaInAs,GaInPAs晶體表面碳污染的去除
REMOVING OF THE CARBON CONTAMINATION FROM GaAs, GaP, InP, GaInAs AND GaInPAs SURFACES
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摘要: 本文以UV/O3法去除GaAs,GaP,InP,GaInAs,GaInPAs晶體表面碳的污染,實驗給出不同的結(jié)果并給予解釋。
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關(guān)鍵詞:
- 光電發(fā)射材料; UV/O3法; AES表面分析
Abstract: The different results of removing the carbon contamination with UV/O3from the GaAs, GaP, InP, GaInAs and GaInPAs surfaces are given. -
J. J. Uebbing, J.Appl. Phys., 2(1970), 41.[2]談凱聲等,電子科學(xué)學(xué)刊,8(1986),155-157. -
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