均勻靜電場偏轉(zhuǎn)系統(tǒng)的幾何象差的計算
CALCULATION FOR GEOMETRICAL ABERRATIONS OF A DEFLECTION SYSTEM WITH A UNIFORM ELECTROSTATIC FIELD
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摘要: 本文從電子在理想均勻靜電場中的運動方程出發(fā),推導(dǎo)出了三級幾何象差的公式。所得結(jié)果不但可用來估算點束或成形束的畸變、象散、和場曲彗差量,而且可用來選擇偏轉(zhuǎn)器的初始尺寸和確定對中偏差所造成的影響。本文還指出了前人工作中存在的一些錯誤。
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關(guān)鍵詞:
Abstract: In this paper, formulas of third geometrical deflection aberratios for an ideal uniform electrostatic field are deritved by solving the motion equations of an electron passing through this field. The results can be used not only to estimate the distortion, astigamatism and field curvature, and coma produced by a Gaussian or shaped electron beam, but also to set the original size of the deflector and determine the effect caused by the misaligument between the electron beam and the deflector. Some mistakes in Sturrock's paper (1955) are also poited out. -
J. Kelly, T, Groves and H. P. Kuo, A High-Current, High Specd Electron Beam Lithography Column, Proceedings of the 16th Symposium on Electron, Ion, and Photon Beam Technology, Dallas,Texas, May 26-29, 1981, p. 936.[2] H. C. Chu and E. Munro, Computational Techniques for Designing Electron Beam Lithography System Containing Any Combination of Electrostatic and Magnetic Lenses and Deflectors, Proceedings of the 6th International Conference on Microlithography, Delft University, Amsterdam 1981, p. 19.[3] P. A. Sturrock, Static and Dynamic Electron Optics, Cambridge University Press, 1955, p. 146.[2]Hilary Moss, Narrow Angle Electron Guns and Cathode Ray Tubes, Academic Press, New York, 1968.[3]西門紀業(yè),電子和離子光學(xué)原理及象差導(dǎo)論,科學(xué)出版社,1983, p.49. -
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