掃描電子束曝光機(jī)復(fù)合物鏡的研究與設(shè)計(jì)
RESEARCH AND DESIGN ON THE COMBINED OBJECTIVE LENSES FOR ELECTRON BEAM LITHOGRAPHY SYSTEMS
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摘要: 在綜合研究已有的各種復(fù)合物鏡(如移動(dòng)物鏡、變軸物鏡和擺動(dòng)物鏡等)的基礎(chǔ)上,本文對(duì)復(fù)合物鏡的一般理論進(jìn)行了探討,推導(dǎo)了普遍化計(jì)算公式,并提出新的復(fù)合物鏡(彎曲物鏡)系統(tǒng)。采用解析函數(shù)近似表示系統(tǒng)場(chǎng)分布,對(duì)彎曲物鏡系統(tǒng)象差進(jìn)行了理論分析,并設(shè)計(jì)出一個(gè)實(shí)際系統(tǒng)。數(shù)值計(jì)算結(jié)果給出該系統(tǒng)在55mm2掃描場(chǎng)內(nèi),束孔徑角5mrad和能散2.5eV下,最大彗差0.005m,橫向色差0.001m。
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關(guān)鍵詞:
- 電子光學(xué); 復(fù)合物鏡; 電子束曝光機(jī); 像差
Abstract: Based on the synthetic study of the previous magnetic combined objective lenses, such as MOL (moving objective lens), VAL (variable axis lens), SOL (swinging objective lens) etc; the general theory of combined objective lenses is approached, and a set of general formulas is presented. A new combined objective lens called Bent Objective Len (BOL) is proposed for improving the optical properties in electron beam systems. Using the analytical functions of the magnetic lens field and electron ray, the aberration analysis of the BOL system is performed, and a practical BOL system is also designed. The numerically computational results indicate that this system offers extremely small coma and transverse chromatic aberrations. At the corner of a 5 X 5mm2 deflection field with a 5 mrad aperture angle and 0.0001 beam voltage ripple, the beam blur caused by coma is 0.00.5 m nad the transverse chromatic aberration is 0.001 m. -
H. Ohiwa, et al., Electronics and Communications in Japan, 54-8(1971)12, 44.[2]H. C. Pfeiffer, G.O.Langner, J. Vac. Sci. Technol., 19(1981)4, 1058.[3]Chen Zhongwei, et al., Optik, 64(1983)4, 341.[4]M, A. Sturans, H. C. Pfeiffer, Proc. Microcircuit Engineering,1984, Academic Press,London, P. 107.[5][5][6]Qiao Yizheng, et al.,The Principle of Pendulum Combined Focusing and Deflection System, International Symposium on Electron Optics, Beijing, China, (1986), p. 207.[7]H. C. Chu, E. Munro, Optik, 81(1982)2, 121. -
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