平行板偏轉(zhuǎn)系統(tǒng)的幾何象差和優(yōu)化設(shè)計(jì)
GEOMETRIC ABERRATIONS AND OPTIMUM DESIGN OF AN ELECTROSTATIC DEFLECTION SYSTEM CONSISTING OF PARALLEL PLANAR CONDENSERS
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摘要: 本文從理想均勻靜電場偏轉(zhuǎn)系統(tǒng)三級幾何象差的公式出發(fā),導(dǎo)出了由兩對互相垂直的偏轉(zhuǎn)板組成的平行平板偏轉(zhuǎn)系統(tǒng)的三級幾何象差公式。這些公式不但可用來快速估算偏轉(zhuǎn)象差,還可用來作為校驗(yàn)數(shù)字計(jì)算程序的理論模型。從水平和垂直方向偏轉(zhuǎn)象散和場曲的影響應(yīng)相同這一要求出發(fā),提出了一種優(yōu)化設(shè)計(jì)方法。在給定偏轉(zhuǎn)區(qū)總長度和兩對偏轉(zhuǎn)板之間的距離后,可以計(jì)算出每對偏轉(zhuǎn)板的最佳長度。文中給出了設(shè)計(jì)數(shù)表,并比較了平行平板偏轉(zhuǎn)系統(tǒng)和八極偏轉(zhuǎn)系統(tǒng)的優(yōu)缺點(diǎn)。
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關(guān)鍵詞:
- 靜電偏轉(zhuǎn); 幾何象差; 優(yōu)化設(shè)計(jì)
Abstract: Formulae of the third order geometric aberrations caused by the pirallcl planar deflection systems consisting of two planar deflectors disposed sequentially and orthogonally have been derived. These formulae can be used as an analytic solution for quickly estimating the geometric aberrations of a known deflection system and checking the related computer program. In view of attaining minimum and equal deflection aberration on the horizontal and vertical sides of a square scanning area, a method of optimum design is proposed. When the total length of the deflection region and the distance between the two deflectors are given, the optimum length of each of the two deflectors can be calculated by this method. -
R. D. Moore, G. A. Caccoma, H. C. Pfeiffer, et al., A High Throughput, High Resolution e-Beam Litho-[2]graphy Tool, Proc. of the 16th Symp. on Electron, Ion and Photon Beam Technology, Dallas, Taxas, May 26-29, 1981, pp. 950-952.[3]J. Kelly, T. Groves, H. P, Kuo, A High-Current, High Speed Electron Beam Lithography Column, Proc. of the 16th Symp. on Electron, Ion, and Photon Beam Technology, Dallas, Taxas, May 26-29, pp.936-[4]940.[5]G, Cogswell, S. Mlyauchi, K. Tanaka, N. Goto, Electron Beam Lithography System with variable-Speed Electron Beam, Proe. 8th Int. Symp. Electron and Ion Beam Soci. Technol., Beijing, 1978, pp. 117-133.[6]江鈞基, 電子科學(xué)學(xué)刊, 8(986), 359-366. -
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